Used VEECO Gen II #293627901 for sale

VARIAN / VEECO GEN II is a cutting-edge molecular beam epitaxy (MBE) system designed to enable the deposition of thin films of high-purity materials with precise control over the material composition and sub-nanometer accuracy in thickness. It utilizes a combination of specialized hardware components, advanced software, and finely tuned processes to ensure layer growth with reliable uniformity. VEECO GEN II has several key components. The base of the system is the vacuum chamber, along with the equipment needed to evacuate and backfill the chamber with the desired processing gases. Inside the chamber there is a substrate heater, which is used to provide precise temperature control of the material to be deposited. An e-beam gun is used to provide a beam of electrons to help promote the desorption, deposition, and/or patterning of materials within the vacuum chamber. The e-beam gun can also be used to vary the dose or intensity of the electron beam, controlling certain properties of the layer growth. Additionally, VARIAN GEN II contains several sets of effusion cells, which allow elemental sources of gas (such as germanium and arsenic) to be dosed into the deposition chamber. These cells have precise temperature controllers and slit collimation assemblies to ensure exact control over the material microstructure and thickness. GEN II also has several sets of shutter assemblies that can be opened or closed to precisely control the amount of material that is admitted into the deposition chamber. VARIAN / VEECO GEN II utilizes a "single cycle" approach for layer growth: the chamber, substrate, and source all cycle together to provide perfect control and uniformity for every layer grown. The chamber can be pressurized and pinned by liquid nitrogen, which increases the throughput and control of the growth rate. VEECO GEN II also has a fully automated "recipe" approach, meaning that a user can input the desired layer parameters and VARIAN GEN II will automatically handle all of the process steps necessary to deposit that layer. The MBE GEN II is the epitome of modern thin film deposition systems. It allows precision layer growth and control over material parameters, while also providing high throughput with its fully automated operations.