Used VEECO Gen II #9080731 for sale

VARIAN / VEECO GEN II is a Molecular Beam Epitaxy (MBE) six-chamber equipment. This system provides for the growth of thin-film materials for applications such as electronic devices, semiconductor heterostructures, and nanoscale structures. The unit is composed of several components, each of which is serving a particular purpose. These components comprise of a cold trap, an evaporator, a deposition chamber, a UHV Shutter, a He plasma source, a high-vacuum pump set, a turbo pump set, a plasma machine, as well as an I/O control and interface. The tool starts by introducing the substrate into the cold trap, where a cooling process occurs. This allows for a uniform temperature distribution over the substrate. Once the substrate is at a pre-defined temperature, an evaporator charges up the material, ready to be heated up and evaporated. After evaporating the material, the new material is deposited onto the substrate surface in the deposition chamber. The gas is introduced into the chamber from the UHV shutter, after which the substrate gets slowly heated up again, so that the new material can be deposited onto the substrate. This is done with a He plasma source that heats the substrate and the material atoms, which is then guided by the rf-plasma and focused towards the substrate. For a higher quality and reproducibility of the thin film, a super high vacuum is used to exclude any undesired gasses or particles from getting into the deposition chamber. Conversely, a turbo pump asset is used to remove any vapors and undesired material from the chamber. For controlling the parameters of the deposition process, such as temperature and time, an I/O control and interface is used to send commands and data to the model. The equipment can be operated and monitored through a GUI (graphical user interface) in order to help improve the accuracy and reproducibility of the thin-film grown. Overall, VEECO GEN II is an excellent system for MBE that allows for growing thin-film materials with high accuracy, precision, and reproducibility. With its components and advanced capabilities, this unit is ideal for a variety of thin-film applications.