Used VEECO Gen II #9238179 for sale

VARIAN / VEECO GEN II is a molecular beam epitaxy (MBE) equipment designed for fabricating high-quality, single-crystal thin films. It utilizes ultra-high vacuum (UHV) levels coupled with a precise graphite effusion source for depositing epitaxial layers. The unique features of this MBE system enable the deposition of high-purity, single-crystal materials possessing excellent electrical properties and surface properties. VEECO GEN II consists of a graphite cross-section effusion source and a two-chamber unit. The source is suspended from a ring arm and contains two knobs that are adjustable throughout the growth process enabling precise deposition of semi-insulating and semiconducting materials. The machine's two-chamber design provides excellent UHV (better than 1x10-10 Torr) by utilizing a mixture of high-purity argon, hydrogen, and helium. It also offers easy access for sample place-ment and loading as well as sample removal. VARIAN GEN II features an on-board computer that communicates with the tool's hardware. This ensures optimum MBE performance by providing precise growth parameters (like temperature, rate of deposition, and substrate control). The computer also controls the asset's real-time gas dosing and deposition rate using a software package connected to a mass flow controller. These features allow users to monitor each growth step and make adjustments as needed. GEN II allows users to precisely fabricate high-quality, single-crystal thin films in a variety of industrial applications. This includes the development of ohmic contacts or gate metallization for semiconductor devices, deposition of high-reflectivity coatings for semiconductor lasers, and fabrication of compound semiconductor devices. The model's high-precision results enable the production of products with superior electrical and mechanical properties when compared with traditional deposition methods. VARIAN / VEECO GEN II is an advanced MBE equipment that offers users a comprehensive range of features for the fabrication of high-quality, single-crystal thin films. The system's two-chamber design provides excellent UHV levels coupled with a precise graphite effusion source for depositing epitaxial layers. Its on-board computer provides precise growth parameters, monitors each step of the growth process, and offers a variety of industrial applications for its use. As such, VEECO GEN II is an ideal choice for those seeking an MBE unit with superior performance.