Used VEECO Gen II #9359604 for sale

Molecular beam epitaxy is an advanced technique for creating thin film materials with precise control over layer thickness, uniformity, and composition. VARIAN / VEECO GEN II is a state-of-the-art molecular beam epitaxy equipment that offers enhanced performance and versatility. VEECO GEN II is designed to achieve higher growth rates than traditional and existing Molecular Beam Epitaxy systems while offering superior control over layer thickness, uniformity and composition. VARIAN GEN II utilizes a Triple Metal, Tri-Source (TMTS) configuration that consists of three independent sources of vaporizable materials. With the TMTS, ultra-low dopant fractions, high area material uniformity, and tunable growth rates, allowing customers to customize their device design for optimal performance. Additionally, the alternative source arm of the TMTS, allows for additional sources of reactant materials to be added for increased compositional flexibility and multi-layer growth. GEN II is also equipped with a real-time in-situ monitoring system and a computer-controlled shutter assembly, which provides more control over film growth. The real-time unit monitors the film thickness, uniformity, and doping levels, allowing for superior control over the material deposition process. The shutter assembly can be used to mask off select regions from deposition, providing more control over impurity concentrations, layer uniformity, and composition. In addition to its enhanced performance, VARIAN / VEECO GEN II offers superior environmental stability and cleanliness. The machine is equipped with ultra-low outgassing Ultra High Vacuum (UHV) components, which reduces the chance of contaminants settling on the wafer. Additionally, VEECO GEN II features a gas beam impeller that helps to eliminate the formation of undesirable dust particles, which can then spiral into the chamber and contaminate the film growth. Overall, VARIAN GEN II is an advanced Molecular Beam Epitaxy tool that offers superior performance, versatility, and environmental stability. By offering superior real-time monitoring capabilities, customizable growth rates and compositions, and ultra-low outgassing components, GEN II provides enhanced control over the deposition process, creating precisely structured thin film materials with uniformity and repeatability.