Used VEECO GEN III-V #9257986 for sale

VEECO GEN III-V Molecular Beam Epitaxy equipment is a one-of-a-kind research tool for Growing nano-scale compound semiconductor materials. It provides world-class research capabilities and performance that enable today's most advanced and innovative devices and materials to be made. The system contains an ultra-high vacuum (UHV) deposition unit that provides the conditions required for growing epitaxial layers from III-V substrates (such as GaAs and GaP). Its powerful set of features include multiple susceptor transport and processing; one to four source crucibles per machine for increased sample uniformity and throughput; and a UHV chamber with a pumped, slotless source and dual, independent effusion cells for expanded research applications. Moreover, it contains several advanced source configurations, such as long-life evaporation sources for longer hours of operation; blanker for higher deposition rates of group-III species; source shutters for exact control of deposition rates; and gas break-in sources. Its high-resolution and fast-response mass spectrometer provides trace measurements of the chamber's gas composition to ensure full control of the film's growth parameters. The tool's UHV-compatible mechanical components, such as the high-thermal gradients laser heating systems, combined with its precise mechanical control of the susceptor, enable scientific and engineering-grade materials to be fabricated in the same asset. GEN III-V offers a wide range of available additional options and features that extend its capabilities dramatically. Custom-built in-situ fluence modules provide top/bottom wafer fluence control down to single-digit percent accuracy, while the "in-situ" QCM can provide real-time deposition rate measurements. Also, the integrated options like the remote sample heating / cooling systems, the sample holder lifts, and the incremental substrate rotation enable ultra-thin layers with extreme uniformity. In addition, its advanced hardware options, such as the automated sample transport with in-situ sample storage and retrieval, automatic substrate loading/unloading, and automated recipe selection, enable the model to work without operators for extended hours. VEECO GEN III-V puts every aspect of molecular beam epitaxy within reach, combining world-class performance with unparalleled flexibility to create the best epitaxial material growth available for research and commercial purposes for the years to come.