Used VEECO GEN III #293627903 for sale

VARIAN / VEECO GEN III is a molecular beam epitaxy (MBE) equipment, which provides a precise atomic reaction environment for advanced deposition. This is done via the precise placement of individual molecules or atoms in preferred locations within a layer or device. VEECO GEN III system utilizes a unique ultrahigh vacuum environment for producing a precise, high purity, and homogeneous results that entirely eliminates the need of further purification or diffusion processes. VARIAN GEN III is offered in three primary unit configurations, catering to different types of MBE deposition tasks. The single wafer machine features a single wafer holder with a heated susceptor, ideal for single-wafer experiments; whereas, the two-wafer tool offers two semi-independent wafer holders with independent heating elements, giving users the ability to deposit to both wafers in tandem. The three-wafer asset is designed for high throughput, with a simple loading/unloading station that allows users to quickly insert three wafers and deposit - this configuration is best used for semiconductor devices and large-area devices such as displays. All of GEN III systems offer full control over all aspects of the deposition process, including pressure, temperature, and flux. The systems also feature a built-in cooling model to dissipation of any heat generated by the device. This cooling equipment, coupled with the powerful flux delivery of VARIAN / VEECO GEN III systems, ensures that deposition is conducted at the most accurate and repeatable rates possible. In terms of wafer size, VEECO GEN III is compatible with a wide range of wafers, and can accommodate wafers up to 200mm in diameter. Additionally, the system features built-in loading and unloading transport and cassette systems, allowing for easy handling and transfer of up to 12 processed wafers. VARIAN GEN III is further equipped with a high-sensitivity quadrupole mass spectrometer for rapid and accurate identification of unwanted background gases, as well as a variety of automation tools for streamlining and enhancing the entire MBE process. Overall, GEN III represents one of the most advanced MBE systems available on the market. Its flux delivery, wafer and device compatibility, automation capabilities, and versatility in terms of unit configurations make it an ideal choice for a wide range of advanced research and development projects.