Used VEECO MOD GEN II #9269863 for sale

VARIAN / VEECO MOD GEN II molecular beam epitaxy (MBE) equipment is a powerful advanced deposition tool which provides nanostructure fabrication and high-precision doping of heterostructures. It utilizes a combination of low pressure and highly focused ultra-high vacuums to achieve the highest degree of control over the deposition of various materials while minimizing contamination. The system offers an individually controlled environment with a wide range of temperature settings and an advanced effusion cell unit. At its core is a rotatable two-axis elevation machine for the delivery of a wide range of materials, aiding in the construction of complex nanostructures. The controlled environment is maintained by a closed loop temperature tool that allows for precise control of the substrate temperature from a few hundred degrees Celsius down to 10K or less. This can be further improved through the use of an optional pneumatically controlled temperature controller. The integrated three-zone effusion cell asset is user-configurable for a range of material types and flux rates. The model can also be equipped with a range of additional accessories such as an in-situ gas degasser and heater, and an in-situ control and monitoring equipment. VEECO MOD GEN II also features a process monitoring system that continually monitors and records possible contamination, allowing the user to have greater control over the process. This can provide invaluable data to increase accuracy and efficiency of the fabrication process. An automated grading unit greatly enhances throughput, allowing up to eight four-inch wafers to be processed simultaneously. The machine can also be pre-programmed with deposition recipes and provides an easy-to-use interface for easy operation and setup. VARIAN MOD GEN II MBE tool is a versatile and compact tool for controlling and precisely manipulating material deposition. It offers a wide range of temperature settings and additional safety features to maximize accuracy and throughput, enabling the user to create high-quality nanostructures quickly. It is an ideal deposition tool for research and development in III-V and IV-V compound semiconductors, nanotechnology, and quantum dot systems.