Used ADVANCED SPIN SYSTEM INC / ASSI SH-801 #9216766 for sale

ID: 9216766
Vintage: 2012
Spin Rinse Dryer (SRD) 2012 vintage.
ADVANCED SPIN Equipment INC / ASSI SH-801 is a state-of-the-art photoresist system for the spin coating of photoresist materials. It is designed for the application of photoresist polymers, such as polymethyl methacrylate (PMMA), polyhydroxy- and polysilicate-based photoresists, to substrates. This unit is ideal for photolithography processes, which allow for the creation of complex and intricate patterns on a substrate. ASSI SH-801 is a fully automated machine capable of producing high-quality thin-film photoresist layers with uniform thickness and uniform resistivity. It features a digital display, and a digital counter to provide accurate and repeatable spin speed settings. An auto-dose feature allows for precise dosing of photoresist without manual intervention. The tool consists of two main components: a microprocessor-controlled spin controller and a spin coater assembly. The spin controller includes a high-performance torque and speed motor which ensure precise and repeatable spin speed throughout the spin-coating process. The spin coater assembly must be firmly attached to the substrate on which photoresist is to be applied. The asset can be operated in either manual or automatic mode. The manual mode allows users to set the desired spin speed and dosing rate, as well as the time the spinner should cycle for. In automatic mode, the model is able to self-calculate the time required to achieve optimal spin speed and thickness of the photoresist layer. ADVANCED SPIN Equipment INC SH-801 is also designed with precise temperature control, which helps to ensure uniform photoresist coating over the entire substrate. The temperature is adjustable, and the system is equipped with a vacuum sensor to accurately measure and adjust the temperature. SH-801 is an efficient and reliable photoresist unit with a wide range of applications. It's easy to use and can be used to create complex and intricate patterns on substrates with a consistent thickness and resistivity. It's suitable for use in a wide range of industries, including micro-electronics, optics, semiconductor and data storage devices.
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