Used ADVANCED SPIN SYSTEM INC / ASSI SH-801 #9242167 for sale

ADVANCED SPIN Equipment INC / ASSI SH-801 is a type of photoresist system, which is used to create images on photosensitive materials such as silicon. The photoresist unit consists of three pieces, the spin coater, the light exposure unit and the developer. The spin coater applies a film of photoresist onto the surface of the substrate. This film is then exposed to light from a light source, which causes the photoresist to become insoluble. This enables the substrate to be developed further using a developer. ASSI SH-801 has been designed specifically for creating fine line patterns for microfabrication and nanofabrication, due to its ability to produce lithographic images with the highest precision. It offers a maximum coating speed of 1000 rpm, allowing for efficient and accurate film application. It also supports a minimum radial speed of 0.1 rpm, which is a key feature for creating images with high binary contrast. The photoresist machine can accept a wide variety of photomasks and reticle plates, allowing for a wide range of design features to be created. It is also designed to be able to tolerate some temperature variation, making it suitable for use in cleanroom environments and environments with fluctuating temperatures. The tool is powered by 220Vac, allowing for ease of power requirements. ADVANCED SPIN Asset INC SH-801 also includes a variety of advanced safety features. The model automatically shuts off when the ambient temperature reaches a set point, and is designed to meet some EMC standards. It also comes with an integrated level sensor, which automatically adjusts the coating head to compensate for tilts or uneven surfaces. Overall, SH-801 is an effective and reliable photoresist equipment for creating high precision lithographic images on photosensitive materials. Its features make it particularly suitable for use in micro-fabrication and nanofabrication environments where accuracy and safety are of the utmost importance.