Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 M1 #293657910 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 M1 is an advanced photoresist spin system designed for accurate and precise deposition of thin film photoresist on semiconductor substrates. This spin unit features a large liquid container for bulk photoresist and a card-based control machine allowing users to rapidly and accurately produce thin films of photoresist on substrates without any manual labor or error. ASSI SV-702 M1 can accommodate up to 8 substrates simultaneously on a ceramic chuck, providing repeatable and reliable thin film deposition with a vast variety of commonly used photoresist media. The motor and supporting hardware unit is designed and tested to ensure low-noise, efficient operation, with multi-variable speed control settings, available for each substrate, allowing for precise coating thickness and uniform spinnings. The photoresist deposition tool comes with a range of peripheral tools to assist in precision thin film deposition. Carefully calibrated temperature control ensures exact photoresist viscosity for the desired substrate performance. A thermally regulated vapor and substrate drying asset can provide drying times optimized for a variety of applications. The model also includes a precise needle air flow equipment that aids in achieving higher spin speeds and improved film uniformity. Automated metrology software comes pre-installed, which allows users to quickly and easily monitor film thickness and other key parameters during photoresist deposition. ADVANCED SPIN System INC SV-702 M1 also provides safety interlocking support with a range of user-defined parameters, alerting users of any potential improper use or potential hazardous conditions. The user-friendly graphical user interface makes it easy to program and monitor the various thin film deposition parameters such as spin speed, temperature, and air flow. In addition, removable alignment jigs simplify substrate placement, thus improving the overall spin unit accuracy and precision. For superior substrate processing, SV-702 M1 is a versatile and reliable photoresist spin machine, which has been designed to ensure the highest level of accuracy and precision while providing safe operation and reliable film deposition. With this tool, users can easily produce thin film photoresist with repeatable performance on a variety of substrates, without any manual labor.