Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 M2 #293650591 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 M2 is a photoresist system designed for precision spin coating of semiconductor wafers and substrates with sub-micron level accuracy. The unit includes a mainframe, front-end controller, upper and lower spin pan assemblies, wafer carrier and sub-micron accuracy spin coating for pre-set process parameters. The upper spin pan precisely controls deposition of photoresist at high speeds, even in challenging environments. The polyethylene top pan is suspended from a precision bearing assembly, providing smooth rotation and accuracy of up to 0.002mm diameter. It is integrated with a fine-tuning stepper motor, allowing precise rotation speeds and uniform spin coating. The lower spin pan is designed to precisely transfer the photoresist liquid. Its three-axis design allows accurate, fine adjustments to the deposition paths, enabling exact coverage of the wafer and achieving precision control. Its high-precision bearing and our advanced back-end controller, allows the deposition of liquid to be precisely adjusted on the plane and at an angle, which is instrumental in controlling the thickness and uniformity of the photoresist layers. The wafer carrier is designed to safely hold and transport wafers, while maintaining their cleanliness. The strong, lightweight aluminum frame and the four corner ratchets ensures the wafers are securely locked in place and that the wafer carrier is securely attached to the main unit. The precision control software allows for easy setup and adjustment of the machine, allowing for automated and repeatable operations. It features a graphical user interface and a wide range of customization parameters, such as spin velocity and spin direction and settings for the upper and lower spin pan sizes. ASSI SV-702 M2 provides precise and accurate control of photoresist spin coating process. Sub-micron accuracy precision spin coating can be achieved and tight parameters can be customized to achieve consistent coating results. It is a cost effective, dependable and precise tool for semiconductor photoresist process applications.