Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 M2 #9155954 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 M2 photoresist system is a next-generation microfabrication tool designed for the lithographic processing of substrates with nanometer-scale features. It takes advantage of a gentle "spin-on-glass" technique to create thin-film, light-sensitive photoresist coatings of varying thicknesses on surfaces. ASSI SV-702 M2 is a high-precision, full-enclosure unit that allows users to precisely control the thickness, shape and size of the photoresist layers on a given substrate. This is accomplished through a variable-speed spinner, adjustable deposition rate and a precise exposure chamber. Together, they allow users to pattern nanoscale features on any material. The unit is made of superior quality materials, and its proprietary hardware and software has been designed to ensure consistency and repeatability in the substrate's surface characteristics. The software also allows users to continuously monitor the deposited photoresist thickness with the automatic self-inspection feature. The spinnable holder in the unit is designed to accurately align the substrate for spin coat-on-glass processing. This ensures uniform photoresist coating across the surface, regardless of size and shape. In addition, ADVANCED SPIN Unit INC SV-702 M2 is equipped with a powerful and expandable library of recipes, making it easy to quickly tailor the photoresist's coating for specific substrates. Furthermore, the unit is designed to be compatible with a range of liquids and other materials, allowing for precise deposition of photoresists and other processing fluids on surfaces. Overall, SV-702 M2 is a state-of-the-art photoresist machine designed for use in nanoscale fabrication. With its advanced features and precise control, users can achieve repeatable and homogeneous thin-film photoresist coatings that are compatible with a wide range of materials.