Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 M2 #9156021 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 M2 is a photoresist spin coating system designed for the latest lithography techniques. The unit is designed to provide a highly reproducible and reliable method of spindle coating and developing thin and thick film photoresists. It has an intuitive control machine that makes it easy to use. The tool is composed of several components, including a spin-coating chuck, a photoresist dispense module, and an integrated platter drive. The spin-coating chuck enables the uniform deposition of the photoresist over a substrate. Its holding capacity ranges from 1" or 2" diameter wafers to 12" wafers, and substrates can be thin or thick, rigid or flexible. The photoresist dispense module is designed for fast loading and unloading of photoresist, and for precise dispensing of photoresist into the spin-coating chuck. It also comes with multiple reservoir options to suit various types of photoresist. The integrated platter drive provides the rapid speed necessary for high throughput applications. It uses advanced torque control to ensure accurate and repeatable results. The asset provides excellent performance and repeatability of spindle coating and developing operations, and it is particularly suitable for low-volume, high performance applications. The model can be easily configured for manual, semi-automatic, or fully automated production environments. It is compact and easy to use, and offers various options to meet the specific requirements of the application. Additionally, the equipment is designed with safety in mind, and equipped with a delay-heat option that allows for complete removal of liquid photoresist before handling. ASSI SV-702 M2 is an ideal choice for producing high-quality photoresist lithography devices and for photomask editing. It has been designed to provide superior performance, repeatability, and safety, and can be adapted to meet the needs of various applications.