Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #293601652 for sale

ID: 293601652
Wafer Size: 2"-6"
Spin Rinse Dryer (SRD), 2"-6" Electro-polished stainless chamber Maximum speed: 2,800 RPM Rinse and dry time: 0-9999 sec On-Board N2 Heater N2 Filter Anti-static cell Resitivity Monitor (RM) SDC-01 Controller Door seal lock Thermo sensor Pressure switch Human Machine Interface (HMI) Pre-heat N2 setting Throughput: 300-2400 Wafer an hour (2") Uptime: >95% Option: Manual door EPO Emergency off switch.
ADVANCED SPIN Equipment INC / ASSI SV-702 is a state-of-the-art photoresist system that provides unmatched precision and performance when processing mission critical components. This machine is designed to provide automated deposition of an ultra-thin layer of photoresist that can be precisely patterned using photolithography. Its advanced spinner motor, integrated wafer alignment feature, and high resolution digital display accurately monitor the application of photoresist during the spin-coating process. This unit is equipped with a full range of DI and DC spiir sources, allowing for full customization to meet the exact needs of each user. ASSI SV-702 offers an array of features that ensure flawless deposition and photoresist coating. One of these features is its precision wafer alignment, which allows for accurate positioning of the photoresist on the wafer surface. This machine eliminates the opportunity for accidental misalignment and ensures that the photoresist is uniformly and accurately applied to the wafer surface. The tool also features superior control of the spin speed, allowing users to maintain an ideal spin speed for ideal coating consistency. This feature ensures that the photoresist is precisely and evenly spread across the wafer surface, allowing for coating accurate to within one micron in thickness. In addition, ADVANCED SPIN Asset INC SV-702 is engineered to achieve superior uniformity within the coating across the entire wafer surface. This is accomplished by the use of a dual-flow spinner motor. This motor carefully and evenly spins the photoresist at an optimal speed, while a precision radiator evenly distributes the heat. This ensures that the photoresist temperature is maintained at a uniform level, allowing for uniformity of deposition thickness. The model also offers flexibility and compatibility with a wide range of photoresists. This allows users to effortlessly choose the photoresist that best suits their particular application. SV-702 is also equipped with a high-resolution digital display, allowing for higher accuracy and better visualization of coating programming. Overall, ADVANCED SPIN Equipment INC / ASSI SV-702 is a state-of-the-art photoresist system that provides users with unmatched accuracy and precision when processing mission-critical components. Its advanced features, wide compatibility, and high resolution digital display make it the ideal solution for photoresist processing needs.
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