Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9155953 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 photoresist system is a sophisticated manufacturing tool designed to manufacturer microelectromechanical systems with high precision and accuracy. It is composed of the main photoresist unit, an automated handling cabinet, a resist pre-bake unit, spin and spray function, a hotplate, recirculation pump unit, and components for acid rinse to enable wafer passivation. The main photoresist unit is a self-contained unit with the user-friendly interface. It is composed of the dispenser, pump, stirrer and reservoirs for the single and mixed photoresists. The dispensing of the photoresist is accomplished by a high-pressure micro-pump that provides an accurate and consistent flow for each application. The stirrer in the unit is used to maintain the correct viscosity of the photoresist solution while dispensing. The reservoirs allow for use of the single or mixed photoresists while allowing pumping between different solution containers. The automated handling cabinet consists of a series of drawers for the wafer holders to be placed into the machine for processing, as well as a tray that can be loaded with multiple wafers at once. The automated handling tool allows for the transfer of the wafer from reservoirs to the spin and spray function. The resist pre-bake unit is a asset that ensures wafer stability when exposed to the resist process. The unit is composed of a pre-heating oven which have both bottom heaters and top heaters. The bottom heater helps to create the desired temperature distribution on the wafer while the top heater ensure uniform resist thickness. The spin and spray unit is a module composed of the spin and spray chamber. It is used for the uniform application of photoresist on the surface of a wafer. The unit operates via a rapid spin of the wafer placed in the chamber. When combined with the air cylinder, the spin and spray unit functions to evenly distribute the photoresist onto the surface of the wafer. The hotplate provides a platform where the wafer can be heated evenly up to a maximum of 125 degree Celsius. It is a temperature-controlled surface on which the wafer can be heated for baking, while stirred with a stir bar to ensure uniform resist thickness. The recirculation pump model is composed of a series of pumps that circulate the photoresist. This equipment ensures that the photoresists remains constantly homogeneous and within the acceptable parameters. The acid rinse components are used for wafer passivation. This helps to ensure that the wafer surface is not contaminated with residues of the photoresist solution and other components used for etching processes. ASSI SV-702 photoresist system is a highly advanced manufacturing tool with key functions for precision and accuracy in microelectromechanical unit production. With its automated handling cabinet, resist pre-bake unit, spin and spray function, hotplate, recirculation pump machine, and acid rinse components, it provides manufacturers the ability to achieve efficient and reliable production processes.