Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9156022 for sale

ID: 9156022
Vintage: 2008
Spin Rinse Dryers (SRD) With SCD-1 controller 2008 vintage.
ADVANCED SPIN Equipment INC / ASSI SV-702 Photoresist System is a high-performance development unit designed for the production of integrated circuits. The machine utilizes a patented spin coating process to create thin-film resist patterns. The spin coating process is a highly efficient means of coating a substrate with a wide variety of materials, including photoresists. The process requires spinning the substrate between two mirrors while applying a photoresist material and then photoprocessing the wet resist before it dries. ASSI SV-702 Tool is designed to maximize production yield, ensure consistent quality, and minimize waste. ADVANCED SPIN Asset INC SV-702 model has multiple features to tailor the process for individual films or substrate types. This includes a rotary stage that rotates the cassette holder for adjoint film coating, a very low immersion quartz nozzle for efficient resist delivery and uniformity, and an adjustable substrate clamp for repeatable and accurate alignment. The equipment also has a remote-controllable interface, enabling users to run the system remotely via Ethernet. SV-702 unit also includes powerful features to analyze images and print process results such as microscope images, cross sections, spectral profiles, developed profiles, and dry-film thickness. These features enable users to precisely set optimal process conditions for each individual film type. This includes the ability to set optimal spin speed, substrate clamping pressure, as well as material wetness parameters. These parameters can be adjusted to match every individual process for repeatable results. The machine has an integrated data recorder for tracking process stability and quality control. This allows users to monitor recipes and process parameters over a long period of time for advanced process management. The tool also includes an advanced control asset for achieving excellent registration and alignment between multiple films. Overall, ADVANCED SPIN Model INC / ASSI SV-702 Photoresist Equipment is an advanced tool for rapid development of integrated circuits. The system is designed to maximize production yield, ensure consistent quality, and minimize waste. It has features for precise adjustment of spin speeds, wetness parameters, and advanced data logging capability for advanced process management. The unit also has a remote-controllable interface for users to run the machine remotely. ASSI SV-702 Photoresist Tool is ideal for production applications of integrated circuits.
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