Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9294809 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 is a powerful and advanced photoresist unit designed to provide excellent results in a reliable and efficient manner. This system utilizes advanced technology to create highly sensitive and consistent irradiation of the photoresist material. ASSI SV-702 is a highly-sophisticated roll-to-roll unit that allows for precision control over image processing on very thin substrates. It utilizes a HeNe laser in order to precisely and accurately irradiate the photoresist material. This ensures an extremely reliable process where the same high-quality results are consistently attained. The machine has three main components - the core, the dishwasher and the cleaner. The core produces the laser, with the dishwasher being responsible for the washing of the photoresist material after irradiation. The cleaner is used to facilitate a homogenous and consistent irradiation process. The core is powered by a unique infrared light source that facilitates a fast and reliable irradiation process. It has been designed to be incredibly efficient and utilizes a compact tool design in order to save space. This allows the asset to be easily integrated into any given workflow. The model is very user friendly and provides an easy-to-operate interface that allows the user to quickly select preferred settings for the laser irradiation. Furthermore, its advanced software allows for complete parameter control and monitoring. This ensures that the image processing is performed in a reliable manner and in accordance to the user's desired settings. ADVANCED SPIN Equipment INC SV-702 is an exceptional photoresist system that provides an efficient, reliable and advanced method for image processing. It has been praised for its accuracy and ability to deliver extremely high-quality results. Its unique design and advanced technology allow it to be easily integrated into any given workflow. This highly advanced unit is sure to provide excellent irradiation of photoresist materials and achieved desired results.