Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9358968 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 photoresist system is a revolutionary tool for the preparation of high-quality measurement specimens, specifically designed to work with the latest optoelectronic semiconductor devices. This unit uses advanced spin coating technology to enable the user to deposit thin films of photoresist on to substrate material in a wide range of thicknesses with excellent uniformity. The machine includes a spin coating chamber, a dispense station, and a post-bake station, all of which can be integrated with an existing process. The spin coating chamber is uniquely designed to provide a uniform field of rotation that allows for an even distribution of the resist material when applied. This allows for improved film thickness and uniformity compared to other spin coating processes. The chamber consists of a two-stage chamber, a substrate holder, and a vacuum sub-chamber. The chamber features automated control valves that enable precise rotation speed and vacuum settings for optimal results. The dispense station includes a multi-head pump that is used to dispense precise amounts of resist material onto the substrate. This setup enables accurate process monitoring and control, as well as reduces the possibility of run-to-run variation in resist thickness. The pump can handle a wide range of viscosities and volumes, allowing for the application of both UV and e-beam resists. The post-bake station is designed to provide an automated and uniform tool of post-bake temperature management. This station maintains precise temperature settings for post-bake processing of the substrate, enabling uniform resist thickness and film homogeneity across a batch of devices. The post-bake station utilizes a high heat transfer rate in order to ensure fast sample cooling after the post-bake process has been completed. ASSI SV-702 photoresist asset is a powerful tool for modern semiconductor and optoelectronic device manufacturing. The model allows for the application of photoresist with excellent uniformity and accuracy, while the post-bake station enables uniform resist thickness and homogeneity. This equipment is a reliable and versatile tool for the preparation of any precision measurement specimen.