Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9397636 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 Photoresist System is an advanced, industrial grade photoresist unit specifically designed for high-volume wafer photolithography and spin coating processes. This machine is capable of delivering precision, high-resolution results on a variety of spun coated films, substrates and materials. ASSI SV-702 features a base platform that can accommodate up to eight spinner units and two alignment notches for centered mounting of substrates. This platform is controlled by a touchscreen display, allowing for precise program settings. The spin pressure and speed of the platform can be adjustable to various levels, and the platform features a low installation height which makes it suitable for a broad range of lithography applications. The tool comes with a variety of tools for accurate, high-volume spin-coating processes. It includes an automated syringe demander, a loaded syringe carousel, a numeric paddle and an ergonomically designed spinner unit. The syringe demander allows the user to select the exact number of substrates and spins that they need, while the syringe carousel houses a variety of syringes so that different types of photoresist can be used in the same run. Meanwhile, the numeric paddle provides precise control over the speed of the substrate motion, as well as providing feedback on the process time. The asset also comes with powerful photoresist processing tools, such as a spin-chamber, a mask loader and a digital control timer. The spin-chamber provides a clean environment for the photoresist processing, allowing for quick substrate loading and unloading, as well as protecting the photoresist from the environment. The mask loader allows for precise, uniform loading of photoresist onto the substrate and is capable of handling multiple substrates per run. The digital control timer provides real-time monitoring of photoresist processing times, allowing the user to repeat or sequence the same settings for multiple runs. Together, these features allow ADVANCED SPIN Model INC SV-702 Photoresist Equipment to provide precise, high-volume results for a variety of photolithography processes. The system is fast, flexible and easy to use, making it ideal for wafer fabs, foundries, integrated device manufacturers and universities.