Used ADVANCED SPIN SYSTEM INC / ASSI SV-802 #293656814 for sale

ADVANCED SPIN Equipment INC / ASSI SV-802 is a photoresist system designed to spin coat and develop resists on a wide range of substrates. The unit is capable of coating photoresist material on a variety of surfaces with a uniform thickness of less than 0.5 microns. It uses a uniform spin flow technique which applies the photoresist material to the desired substrate at a regulated rate. This ensures uniform resist during development and provides repeatable and consistent performance. The machine has a high-performance spinner head with an adjustable spin speed of up to 2000 RPM, as well as a spin range of 0-50 mL/min. It also comes with adjustable flow volume and uniform spin coverage parameters. For precise control, it offers adjustable spin speed and timing parameters and can be programmed in 1-minute increments for precise resist deposition. The photoresist material is poured directly into the spinner head and is pressurized with a special pump for consistent flow rates. The spin head is then clamped to the substrate and spun at a programmable speed, which coats the material exactly how it should be. This also ensures that the photoresist is applied uniformly across the entire surface. The RESI-Track Software is also included for quick management and development processes. This includes a programmable vision key for fast alignment, an adjustable backlight with integrated alignment aids, and integrated high-resolution imaging. The software is also compatible with a range of advanced imaging and scanning tools, providing the user with fine-tuned control over their application. The tool has been designed for long-term use and features a variety of quality-control settings, such as bake temperatures, bake times, overcoat times, and curing temperatures. It is also equipped with over-temperature and short-circuit protection to ensure the longest life and best performance available. ASSI SV-802 photoresist asset is ideal for photolithography, etching, and other micro fabrication processes. It provides an extremely thin, uniform coating of photoresist material and is designed for fast and accurate setup. It is a great solution for precise control over coating and resist deposition.