Used ADVANCED SPIN SYSTEM INC / ASSI SV-802 #9358969 for sale

ADVANCED SPIN SYSTEM INC / ASSI SV-802
ID: 9358969
Wafer Size: 8"
Spin Rinse Dryer (SRD), 8".
ADVANCED SPIN Equipment INC / ASSI SV-802 is a photoresist system specifically designed to provide high-efficiency lithography processing of thin-film polymers materials such as step-and-repeat photoresists. The unit can deposit thin-film photosensitive polymers with highly accurate exposure control, while providing a wide range of spin-coating speeds and track angles. ASSI SV-802 machine also supports replication processes such as photoresist patterning, pattern replication, and wafer transfer. The tool's high-efficiency lithography process is achieved by its precision component-level spin-coater. This spin-coater is capable of taking up to 4 substrates at a time and is equipped with a high-volume precision gear-driven motor for uniform spin coating, allowing it to provide precision exposure control. The spin-coater is also controlled by a modern PLC for ensuring a repeatable and consistent coating process. The asset can also deposit multiple polymers with different properties and coat thickness. ADVANCED SPIN Model INC SV-802's advanced image control gate can accurately process substrates with resolutions up to 200nm, while its track angle can be adjusted between 0 and 180° per side. Additionally, the equipment's multiple exposure sources, precise counters, and edge registration device provide a high level of accuracy, repeatability, and speed. SV-802 system also is equipped with a unique back-side flood exposure unit that can be used for back-side process or partial coverage of the substrate. The unit can also accurately Align and resolve the substrate's desired pattern. ADVANCED SPIN Machine INC / ASSI SV-802's advanced capabilities have made it the perfect choice for a range of steps in thin-film lithography fabrication processes, from resist coating to replication. It is also an ideal option for a range of processes, such as semiconductor fabrication, organic and inorganic thin film production, liquid crystal device production, etc. With a wide range of features and accurate, precise results, ASSI SV-802 is a powerful and reliable photoresist tool.
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