Used AGAR SCIENTIFIC 108C #9221130 for sale

AGAR AGAR SCIENTIFIC 108C is a high performance photo resist equipment designed to produce reliable and consistent results for commercial grade lithography applications. It is a single-layer dry processable photoresist system with superior adhesion, improved post exposure delay printing and other features. AGAR 108C is a water based photosensitive solution, consisting of highly stable photosensitive components such as acrylate and polyhydroxystyrene-based resist materials. These materials are specifically designed for use in optical lithography to create patterns and features on semiconductor wafers. The photo resist unit is made up of a liquid photocurable monomer that is applied to the wafer surface prior to film exposure. Upon exposure, the photosensitive molecules undergo a chain polymerization reaction which results in a cross-linked polymeric structure. It has excellent resolution, small feature size and good sidewall angle. AGAR AGAR SCIENTIFIC 108C is designed to simplify working procedures. Its unique pre-exposure bake technology and post-exposure delay printing reduce the number of process steps and help improve throughput. It also offers excellent performance over a broad range of sensitive materials and exposure conditions. AGAR 108C is well suited for applications that require high resolution printing and advanced overlay control. It is available in different formulations, such as positive-tone, negative-tone and dual-tone resists, to accommodate different exposure techniques and devices. It is also compatible with a wide range of standard and advanced coating materials. In addition, AGAR AGAR SCIENTIFIC 108C is extremely resistant to solvents and high temperatures, allowing for superior long-term stability. It is also resistant to etching processes, preventing loss of pattern fidelity and improving yield. Overall, AGAR 108C is a high-performance photoresist machine that offers robust features and reliable long-term performance for commercial-grade optical lithography applications. It enables users to reliably create fine features and patterns on semiconductor wafers with great accuracy and repeatability.