Used AIO 603-4 Sonic Fog #9124425 for sale

AIO 603-4 is a variant of Sonicate's photoresist system, designed for high quality lithography in a research setting. It is able to produce precise features with an extremely small line width down to 10nm, allowing it to be used for submicron patterning in applications such as MEMS and displays. The unit includes a laser source which emits at a wavelength of 248nm, that is directed onto a substrate plate. The laser is shuttered at extremely high speeds to control the exposure of the photoresist. The laser is modulated to allow for multiple passes of different wavelengths and intensities, allowing the user to optimise the resolution of the patterned area. The unit is also capable of performing very low energy exposure patterning, allowing for non-linear patterning so that large features can be patterned with more intensity while small features can be patterned with a lower intensity. AIO 603-4 also has an anti-reflection coating on the substrate plate, which helps to reduce the scattering of the laser beam, helping to keep the beams focussed and allow for narrower linewidths. AIO 603-4 also comes with a precision Z-stage, which is used to position the substrate plate with respect to the laser source. This is used to ensure that the laser beam is correctly aligned with the substrate to ensure precise, repeatable patterning. The unit is equipped with an automated system for exposing and developing the photoresist, which helps to keep the lithography process quick and accurate. The develop and stripping capability allows for multiple patterns to be developed on the substrate without the need for manual cleaning. In conclusion, AIO 603-4 Sonic Fog provides excellent patterning for high quality lithography in a research setting. Its ability to produce features with an extremely small line width, as well as its automated exposure and develop system makes it ideal for applications requiring submicron patterning.