Used AIO SF 600 #9139571 for sale

AIO SF 600 is a photoresist equipment designed for the development of sensitive and large area lithographic processes. It is suitable for use with both positive and negative photoresists, allowing for the precise development of metal patterns, wiring, and photo-etching processes. The system is composed of four distinct units, the developer, the exposure unit, the rinse unit, and the vacuum chamber. The developer is a two-stage process. The first stage involves mixing the photoresist solution with the developer concentrate and spraying it onto the substrate. This creates an effective concentration of developer, which ensures that the photoresist is properly developed. The second stage is the wetting-out step, which is necessary to ensure that the developer is evenly and homogeneously distributed over the substrate. The exposure unit gives the photoresist the necessary exposure through a mask, allowing a circuit to be patterned or a proper photo-etching process to be applied. Its tunable sources and customized exposure times guarantee short and uniform exposures for high-precision results. Its specially designed lens unit offers homogenous illumination for maximum pattern definition. The rinse unit is designed for maximum photoresist removal while preventing tunnelling and accumulation of residues. Its intelligent controls ensure a precise adjustment of the rinse time, pressure, and temperature for optimum photoresist removal. The unit is equipped with a built-in recirculating rinse water machine for maximum efficiency and usage. The vacuum chamber helps to keep the photoresist from flowing out of the desired patterned area throughout the development process. Its built-in adjustable pressure and heating tool ensure a consistent and accurate creation of vacuum. The adjustable heating helps to adjust the heat flow of the photoresist in order to make the photoresist more resistant to adhesion or other physical phenomena. SF 600 is a highly advanced photoresist asset and offers precision and accuracy that complete any lithographic or etching project. Its features enable high-quality development of metal patterns, wiring, and photo-etching processes for a wide range of applications.