Used ALLTEQ 1520 #101471 for sale

ALLTEQ 1520 Photoresist Equipment is a reliable, user-friendly system for dispensing photoresist. It is designed for developing and etching photoresist films in the fabrication of silicon wafers, printed circuit boards and other microelectronic devices. The unit includes a cooling platform for improved process repeatability, precision pressure control for increased accuracy, and a controller for enhanced productivity. 1520 features an adjustable, ergonomic platform and stationary cup feeder, enabling users to easily adjust the height and direction of the cup delivery and control the stroke length and depth. The machine also features a modulated recirculating pump and a choice of two metering systems, providing precision pressure control and accurate and consistent fluid delivery. Additionally, the tool allows for the use of high-molecular-weight polymers, providing compatibility with a variety of photoresist coatings. ALLTEQ 1520 is also fitted with a graphic user interface, which allows for set-up and control of machine functions. The intuitive interface enables users to quickly program the desired parameters, including temperature range and stroke frequency, and to customize the pump curves. The asset also features an easy-to-use, four-button operation and comes with an audible alarm to indicate when the process is complete. 1520 is designed to be energy efficient, eliminating energy waste and providing energy savings over similar machines. The model is highly durable, with a solid-state design and welded-steel frame, making it ideal for industrial use. The equipment is also relatively easy to install and features a modular design, allowing for additional features and upgrades to be added or exchanged at any time. Overall, ALLTEQ 1520 Photoresist System is an efficient, user-friendly unit for dispensing photoresist in the fabrication of microelectronic devices. With its adjustable platform, precision pressure control, and intuitive user interface, the machine offers enhanced accuracy, productivity, and reliability for all types of photoresist applications.