Used ALLTEQ L1600 #293748752 for sale

ALLTEQ L1600 is a high-precision automated photoresist equipment designed to meet the stringent requirements of semiconductor manufacturing. The system is designed with a compact footprint and offers a wide range of off-axis illumination tools for numerous applications, such as wafer scanning, 5x reduction scanning, darkfield scanning, and 4x reduction imaging lithography. L1600 unit makes use of a state-of-the-art CCD digital imaging machine, allowing for the acquisition of image data at high speed and accuracy. The tool also includes a full suite of wafer position monitoring, temperature control, and autofocus capabilities, as well as options for a variety of lithography patterns, project modes, and software control functions. The asset offers a wide range of exposure resolutions, ranging from ¼-µm to 4 µm, and full-field, µm-dynamic depth of focus (DOF) control. In addition, the model provides high-contrast imaging and a high-resolution, high-accuracy etching capability to facilitate the 6-inch wafer production process. The equipment also has four large-aperture design objectives, capable of providing up to 0.3-µm DOF over a wide range of wavelengths. Furthermore, the system is fully compatible with several image processing and image intensification algorithms and is capable of simultaneously controlling multiple art files and multiple exposure heads. Finally, ALLTEQ L1600 incorporates advanced calibration technology that is capable of automatically calibrating both chemical reactors and the associated lamps, enabling rapid process optimization. The integrated scanning unit provides real-time focus monitoring for sub-wavelength precision throughout the process, conserving valuable time and resources during the production process.