Used AMAT / APPLIED MATERIALS Raider ECD #9197689 for sale

AMAT / APPLIED MATERIALS Raider ECD is an advanced photoresist equipment that enables superior photolithography applications. This system is based on a positive tone, electron beam-sensitive photoresist unit that provides superior resolution, low defectivity and improved resistance to alkaline develop solutions. It is optimized for the performance of a variety of front-end and back-end processing applications. The photoresist utilized by AMAT Raider ECD is composed of a positive resistive material of a silicone-type resin, PMMA, and other additives. The resist is sensitive to electron beams and is extremely sensitive to exposure processes such as ultraviolet light, x-ray, and electron beams. The resist is typically deposited on a semiconductor wafer or other substrate using a spin-coating process. The photoresist machine has two major functions: first, to establish contact with the target layer and secondly, to protect the underlying substrate during processing. APPLIED MATERIALS Raider ECD can accomplish both these functions through its two-layer tool. The first layer is known as the base resist, while the second layer is referred to as the bond layer. The base resist provides protection during processing and reduces reflectivity. It serves as a strong mechanical and chemical barrier to protect the underlying substrate from contamination and damage from exposure to clean room environments such as acid, base, solvents, etchants etc. The base resist also acts as an adhesive for the bond layer, which is formed after exposure to a photoresist. The bond layer is an unaffected portion of the photoresist layer that remains attached to the target layer after the patterning process is completed. This layer helps to minimize contact and oxide masking defects, allowing for superior resolution and superior adhesion to the substrate. Raider ECD asset provides superior resistivity and adhesion to a variety of substrates and wafer technologies. It also has excellent edge definition and improved post-developing cleanliness and uniformity. The model is also extremely fast, exhibiting superior speed and throughput to other photoresist systems. AMAT / APPLIED MATERIALS Raider ECD equipment is designed to optimize the performance of a variety of processes in semiconductor and MEMS device subcontract. It can be used with a range of materials, including copper, aluminum and silic Faraday cages, silicon nitride, and stannic oxides. The system is also compatible with electroplating processes, providing superior results in terms of filling, planarity and uniformity. In conclusion, AMAT Raider ECD unit is an advanced photoresist solution that provides superior resolution and low defectivity, along with improved resistance to alkaline developers. This machine is a great choice for lithography processing, enabling superior edge definition, superior speed and throughput, and excellent resistivity and adhesion to a broad range of substrates.