Used AND ASP-2000 #9373108 for sale

AND ASP-2000 is a photoresist equipment manufactured by Nihon TechnoChem that is used for advanced photolithography. This system uses a combination of light, solvents AND ultraviolet radiation to etch patterns onto a substrate such as silicon wafers. ASP-2000 can work with single or double-sided wafers, depending on the application. It starts by treating the wafers with a special combination of non-aqueous, polar AND protic solvents in order to remove contaminants. This also ensures that the photoresist coating that will be applied evenly adheres to the substrate. After the wafer has been prepped, AND ASP-2000 applies a photoresist coating. The unit is designed to allow different types of photoresist to be chosen depending on the feature dimensions required for a particular application. Once the photoresist has been applied, the wafer is exposed to wavelengths of light that correspond to the shapes AND patterns being created. The light is passed over the wafers several times, allowing layers of photoresist with different chemical properties to be applied. At this point, the wafer is ready for development. Depending on the application, an oxygen plasma or air-based method can be used to etch the exposed patterns into the photoresist. During this step, the air or plasma removes any remaining contaminants AND also primes the photoresist so that it can be removed more easily later on. Finally, the unwanted photoresist is dissolved away using a combination of heated baths AND chemical treatments, leaving the desired patterns on the substrate. If a double-sided wafer needs to be processed, then the same steps are repeated on the second side. ASP-2000 is a powerful AND versatile photoresist machine that can be used for a variety of applications. It is highly reliable, with a high throughput capabilities, making it a popular choice among chip manufacturers.