Used AND ASP-2000LX #9205492 for sale

AND ASP-2000LX
Manufacturer
AND
Model
ASP-2000LX
ID: 9205492
Wafer Size: 2"
Vintage: 2011
Track, 2" 2011 vintage.
AND ASP-2000LX is a state of the art photoresist equipment designed for use in the production of advanced electronic components such as integrated circuits, opto-electronic components, displays, AND more. In general, photoresist systems perform the same basic process; selectively applying a masking material onto a substrate to create a patterned layer for subsequent processes. ASP-2000LX goes a step further, with an advanced beam-writing technique that allows extremely precise AND accurate patterning of the photoresist. This is done by using a laser beam to precisely scan AND etch the desired pattern into the photoresist. The accuracy of the masking process is further enhanced by the inclusion of a Direct Viewing Mask Alignment (DMVA) system, which works in conjunction with the beam-writing technique to further ensure that the etched pattern is precise AND precise to within 0.1 micrometers. The unit also includes a variable aspect-ratio capability, which allows users to fine tune the thickness of the photoresist layer. In addition to its precise patterning capabilities, AND ASP-2000LX also provides a highly versatile platform for photoresist processing. The machine can be equipped with a range of different photoresist formulations, from standard negative photoresist to positive photoresist, AND a variety of additional additives can be included in the formulation to suit specific application requirements. Finally, ASP-2000LX is extremely user friendly, AND includes a comprehensive control interface with advanced diagnostics AND monitoring features. This ensures that operators can make quick AND easy adjustments to the tool, AND program the required parameters for their specific photoresist process. Overall, AND ASP-2000LX is an incredibly advanced AND highly precise photoresist asset which provides a versatile AND user friendly platform for creating intricate patterns in a range of substrates. With its cutting edge beam-writing technique AND advanced diagnostics, the model is an ideal choice for the production of advanced electronic components.
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