Used AND ASP-2000LX #9375095 for sale

AND ASP-2000LX photoresist equipment is a state-of-the-art photolithography system designed for highly precise micro-fabrication of semiconductor materials AND other sensitive products. This lithography unit is capable of producing structures as small as 0.5 microns (0.0000002 inches). The machine has multiple user-friendly features, such as multi-layer exposure, which accelerates the process by simultaneously exposing several layers, as well as advanced alignment registration mechanism. ASP-2000LX tool's design utilizes a proprietary dual light source. The asset is furnished with an unfiltered mercury lamp AND a filtered LED array that provides a broad spectrum of light. These two light sources can be employed separately, or together in a wide range of multi-layer exposures. The dual-light source design increases throughput AND throughput, while providing greater accuracy AND resolution in its photolithography process. The multiple-layer exposure is enabled by precision alignment registration. This mechanism uses a combination of vision alignment, automatic XY stage, laser interferometer, AND edge detection methods to ensure accurate alignment between the multiple layers. The automatic XY stage also comes with a precision controller, for the exact positioning of layer edges. In addition to high-precision multi-layer exposure, AND ASP-2000LX model is fitted with an advanced photograph development equipment that allows for automated processing of photoresist images. This includes automated photo- chemistry, resist development stage, AND post-development inspection. The automated system ensures that each layer is developed uniformly, AND with consistently high resolution. Furthermore, ASP-2000LX unit is equipped with an on-board data logger. This centrally located data logger allows for the easy AND secure collection of test results AND development data. This gives operators the ability to review AND analyze process performance AND develop better process parameters. AND ASP-2000LX photoresist machine is a powerful AND reliable tool for precise microfabrication of sensitive AND semiconductor materials. With its advanced dual-light source technology, multi-layer exposure capability, precision alignment registration, advanced photograph development tool, AND on-board data logger, this asset is a highly cost-effective AND efficient lithography model for producing high-quality photoresist products.