Used AND ASP-2000X #9373110 for sale

AND ASP-2000X Photoresist Equipment is a key element in the fabrication of high-precision microelectronic components. The system consists of an advanced, high-precision exposure unit, a chemical delivery machine, AND a vacuum spinning platform, which together provide a comprehensive wet chemical solution for the processing of small microelectronic components. The Exposure Tool uses an electron beam unit to very accurately expose the optimal levels of UV light AND chemicals to the right areas of the substrate. The asset has the capability to pattern submicron sized features with extreme accuracy AND repeatability. The chemical delivery model pumps chemicals precisely into the substrate with the right timing AND accuracy. This ensures that the chemical is in the right form AND at the right concentration to be effective. The vacuum spinning platform is used to spin the substrate at a very slow rate. This ensures that the chemicals are evenly dispersed over the surface of the substrate AND that the right amount of exposure is achieved. The equipment provides a range of options for defining the chemical AND exposure parameters. The system is also capable of multiple chemicals AND exposure times to create 3-dimensional features in the substrate. The unit is capable of creating small features down to 0.1 microns. ASP-2000X is a highly advanced photoresist machine that can be used for the fabrication of small microelectronic components. It provides an accurate AND repeatable solution for patterning as well as a versatile AND flexible range of options for controlling exposure AND chemical deposition. The tool is capable of creating small features down to 0.1 microns on the substrate, ensuring precise AND high-precision microelectronic components.