Used APET FCL-0119 / NEO 2000 #9184969 for sale

The NEO 2000 APET FCL-0119 is a photoresist equipment which consists of a spin coater, a K751-X hot plate, and a wafer alignment. This system is designed for optimal photoresist deposition and wafer alignment for semiconductor applications. The spin coater of the NEO 2000 APET FCL-0119 consists of an integrated spin coating station, which is designed for high accuracy spinning of photoresist solutions. It is equipped with a web driving motor which allows precise control over spin speed and acceleration. The spin chamber is ventilated and controlled with adjustable temperature and humidity sensors to provide a consistent deposition environment. The K751-X hot plate is a reliable, high efficiency, low-heat hot plate used to ensure accurate melting and spreading of photoresist films across substrates. The temperature is maintained within 0.1°C of its preset value. It features an integrated workstation with a user-friendly interface and a precise micro-motor drive with low-noise operation. The wafer alignment is the most important component of the NEO 2000APET FCL-0119 photoresist unit. It is a highly precise, low-noise rectangular construction design which allows for the accurate alignment and registration of wafers during spin coat deposition. This helps to fully cover the surface of the wafer with photoresist film and consequently, to reduce photoresist uniformity variation. The NEO 2000APET FCL-0119 photoresist machine provides a comprehensive, integrated solution for high-precision photoresist coating across semiconductor devices. This tool simplifies the process, ensures uniform deposition of photoresist onto substrates, and minimizes variation in photoresist uniformity. The integrated user interface allows for fast and efficient alignment and adjustment of spin coat deposition parameters and wafers to ensure optimal deposition quality and repeatability.