Used APET NEO 2000 #9198056 for sale

APET NEO 2000 is a photoresist equipment specifically designed for the semiconductor industry. It is a chemically amplified, positive tone photoresist system that is highly sensitive to short and deep ultraviolet (UV) radiation. APET NEO-2000 offers low temperature processing capabilities, making it an ideal resist unit for temperature-sensitive devices. It is commonly used in anisotropic dry etching processes. NEO 2000 consists of three parts: the photoresist developer, the etching solution, and the acid. The photoresist developer is a chemical solution which is used to coat the wafer surface. The main ingredients in this developer are polyvinylphenol (PVP) and an acid salt. This solution allows the photoresist to become reactive when exposed to UV radiation. The etching solution is a chemical compound which contains a proportion of an acid and a buffer. The addition of the acid and buffer allow for the etching of the film on the wafer surface. The acid used in NEO-2000 machine is hydrochloric acid. This acid dissolves the photoresist which is exposed to UV light, allowing the etching solution to take over and etch the film on the wafer. APET NEO 2000 tool requires an ultraviolet or deep ultraviolet radiation source. This radiation source is used to expose the photoresist to create patterns on the wafer surface. This radiation source is usually located in a vacuum and the temperature has to be controlled in order for the reaction to be effective. Due to its excellent resolution and low temperature processing, APET NEO-2000 is widely used in the semiconductor industry. It is a cost-effective way to produce intricate structures with excellent resolution and detail. NEO 2000 is an invaluable tool for the semiconductor industry. Its features of low temperature processing and excellent resolution make it ideal for creating intricate structures. NEO-2000 is highly reliable and cost-effective, making it a smart choice for anyone in the semiconductor industry.