Used APET NEO-3000 RD #9146506 for sale

APET NEO-3000 RD is a top-of-the-line photoresist equipment designed for cleanroom applications. This system offers high resolution and repeatable results with rapid turnaround, allowing for high volume in-line production processes. The unit is designed with a unique optical layout to ensure uniformity and accuracy of the process. The photoresist machine utilizes a g-line/g-sigma laser with a wavelength of 435 nm to precisely expose and create digital patterns onto a substrate. In order to achieve uniform exposure over a wide field, a total of eight coated lenses are used, ensuring that the correct pattern is achieved in the most efficient manner. The photoresist tool also incorporates software algorithms developed specifically for moving parts, ensuring that the pattern is accurately reproduced every time. It allows for the selection of multiple exposure modes depending on the job. This includes the option to select the most suitable exposure, which is predetermined and set by the user. The asset is also equipped with an automated moving stage with a 1-micron resolution and positioning accuracy, allowing the precise positioning and movement of the substrate. The substrate size is adjustable from 0.05mm to 5mm. NEO-3000 RD is equipped with an advanced image processing model, which enables the equipment to accurately measure and analyze the pattern details and to quickly adjust the measurement parameters to ensure the highest accuracy of the pattern. Overall, APET NEO-3000 RD is an ideal choice for producing patterns with precision, accuracy, and reliability. The automated system offers a low cost solution for production requirements, providing a complete photoresist unit tailored to each individual application.