Used APPLIED MULTILAYERS CFM 650 #170770 for sale

APPLIED MULTILAYERS CFM 650 is a photoresist equipment composed of two components: a photosensitive emulsion, and a thickness measurement. This photoresist system provides a reliable solution to the need of precision masking, shielding and deposition, whilst providing highly accurate results on the thickness measurements of all photoresist layers. The photosensitive emulsion is a small particle material, composed of photosensitive molecules, which can be selectively activated with certain wavelength light exposures. This allows for selective developing on different areas of the photoresist layer, allowing for precise patterning of dielectric and insulating layers, for use in device manufacturing. The measurement part of CFM 650, is based on an advanced capacitive displacement sensor technology, with highly accurate 3D scanners, and a simple and user-friendly software. This sensor is used to measure the thickness of the photoresist layers created by the photosensitive emulsion. The test results of APPLIED MULTILAYERS CFM 650 show the very high accuracy and repeatability of the unit, with improved efficiency and throughput, while being completely non-destructive and leaving no undesirable artifacts. The results are extremely accurate and consistent with the intended design, even when subject to constant operation conditions. Furthermore, CFM 650 is a high-precision machine, capable of creating precise patterns on substrates, down to a sub-micron level. In conclusion, APPLIED MULTILAYERS CFM 650 is an excellent photoresist tool with reliable, consistent results. It is composed of two parts: a photosensitive emulsion and a 3D scanner for thickness measurements. The combination of these two components provides for precise patterning on device surfaces, down to a sub-micron level, with improved accuracy and throughput. CFM 650 is a great choice for accurate and precise patterning of surface layers.