Used APPLIED MULTILAYERS CFM 650 #9251234 for sale

APPLIED MULTILAYERS CFM 650 is a photoresist system based on chemical and mechanical properties of photoactive polymers layers (PALS). It is designed to be used in a range of multiple stacked layers on substrates such as glass, semiconductor materials and plastics for micro-electromechanical systems (MEMS) and other integrated circuit fabrication. CFM 650 works in tandem with the Exposure and Develop systems from the APEX Family to provide a truly innovative maskless lithographic solution. APPLIED MULTILAYERS CFM 650 includes a number of features that makes it ideal for MEMS applications. It has an Oxford Instruments ACE3000 auto-aligner which accurately orients the substrate and aligns it with CFM 650 to within 1µm accuracy. This ensures that the process parameters are precisely set for optimal results. Additionally, the APEX control software controls the pile up of the large number of individual layers up to 10µm thick with up to 12-layer stacking. This is done using UV-curable resin to give an above average polymer layer uniformity over highly complex 3D structures. The Photoresist system can also control laser exposure parameters by varying pulse repetition rate, laser power, and focus position. It can also manage the transfer parameters for the developed photoresist patterns from the exposed substrate to a target substrate using an Aculon digital microscope. It has also integrated a Fluorodine (packaging) station which allows for the packaging of the completed products in etched case packages for further integration within a MEMS product. In conclusion, APPLIED MULTILAYERS CFM 650 photoresist system offers highly sophisticated and accurate MEMS fabrication. Its features provide the necessary control of the maskless lithographic process and the uniformity of the photoresist layers to guarantee the ultimate outcome. Furthermore, its ability to automatically transfer and package the completed MEMS products in a fully etched case further increases reliability.