Used APT 9145 EP #9124776 for sale

APT 9145 EP is a photoresist equipment designed to provide the highest resolution patterning of wafers in research, semiconductor, microelectronics, thin-film solar cells and medical device industries. The system uses pre-defined projection masks with illumination patterns that enable the substrate to be exposed at different locations during a single cycle. This kind of projection enables features as small as 42 nm to be patterned on the substrate. The unit features a technologically advanced optical machine with an integrated lens that ensures optimum uniformity and accuracy for demanding photolithography applications. The tool also comes with an adjustable motion stage and a fully automated exposure process for repeatable and uniform processes. The asset utilizes a linear projection telecentric motor to ensure that pattern focus and size are consistently maintained over every square millimeter of the substrate. This ensures that the patterns are created with consistent accuracy. The software that comes with the model is user-friendly and helps users to optimize the parameters of the photoresist equipment, giving users a wealth of options when it comes to how they pattern their substrates. Additionally, the software allows users to quickly store and recall different parameters, allowing repeatable and accurrate results. In terms of post-processing the system features a number of options which helps to ensure that patterned substrates are fully cleaned of residue while maintaining optimal substrate stability. Options include using ozone, haloform and sulphur dioxide in order to clean the substrate thoroughly with minimal damage. The unit also has a water cooling machine that can be used to stabilize substrate temperature during exposure. This tool helps to reduce thermal damage and ensure that the substrate is kept cool during processing. In short, APT 9145EP is a powerful and reliable photoresist asset that offers users a great deal of precision and accuracy for a variety of substrate patterning applications.