Used APT SPIN 200i #9293875 for sale

APT SPIN 200i is a cutting-edge photoresist equipment designed for a wide range of semiconductor and electronics applications. This comprehensive resist processing system was developed to meet the demands of the rapidly expanding semiconductor industry. SPIN 200i utilizes a superior combination of high throughput and precision in a compact, space-saving platform. It is capable of processing a wide range of materials including both solvent-based and water-based resists. Its advanced photomask capability allows for precise pattern registration and enables the production of high-resolution features. APT SPIN 200i utilizes a highly efficient vacuum-assisted spinner mechanism to ensure homogenous coating of the resist onto the substrate. The vacuum-assisted spinner ensures that the resist is spread evenly and consistently across the entire substrate surface. It also utilizes a precision blade-tip spin mechanism to ensure uniform coating thickness. SPIN 200i is operated through a proprietary user-friendly interface, allowing for guidance throughout the process. It includes advanced data collection and reporting capabilities as well as pre-defined recipes for unit parameters, resulting in greater consistency and quality assurance. Additionally, the integrated process control software can be used to monitor and adjust the spinner speed and temperatures in order to refine and repeat the desired process. APT SPIN 200i is powered by advanced environmental control technology, making it an ideal machine for chemically-sensitive applications. Its environmental features include adjustable temperature and humidity controls as well as advanced air and contaminant-filtering capabilities for superior process contamination prevention. In summation, SPIN 200i is a comprehensive photoresist tool that enables precise control of the resist process and ensures the highest quality results. It is an excellent solution for distributed electronics and semiconductor applications.