Used AR BROWN H1220RNN #293589158 for sale

AR BROWN H1220RNN
Manufacturer
AR BROWN
Model
H1220RNN
ID: 293589158
Wafer Size: 6"
Spin dryer, 6".
AR BROWN H1220RNN is a photoresist equipment designed to provide a high-performance microfabrication solution to semiconductor manufacturers. It is an advanced photoresist system which offers precision exposure with the ability to process a wide range of materials, from thin metal films to thick polymer coatings. The photoresist unit utilizes advanced technology to ensure exceptional performance and reliability. It includes a high-sensitivity photomask and light source, along with special optics and filters to accurately define the photomask edge. This provides high resolution imaging that enables lithography of small features. The machine also includes a process tank. This tank allows for precise and repeatable processing of photoresist materials. The tank is equipped with a high-precision mixer and adjustable guide rails to support precise delivery of the photoresist material to the wafer. It is also equipped with an auto-fill tool to ensure uniform coverage. H1220RNN asset is capable of processing a wide range of substrates, including glass, quartz, and polymers. It features advanced UV light exposure and an automated developer model to quickly process photoresist applications. The photomask, processor, and light source are integrated into a closed, dust-tight NASA-standard environment to ensure optimal results. The equipment produces high-resolution lithographic images that are used in the production of a variety of devices, including LEDs and mobile phone components. It is suitable for use in the high-volume production of multiple microelectronic components, including other semiconductors, display devices, and photonic devices. AR BROWN H1220RNN photoresist system is an ideal choice for microfabrication projects. It offers a reliable, high-performance lithography solution with exceptional results. The unit is capable of processing substrates at high precision and offers a wide range of photoresist materials for use in a variety of applications.
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