Used ASI 9025 #9026017 for sale

Manufacturer
ASI
Model
9025
ID: 9026017
LPI developer 24’’ with cascade rinses.
ASI 9025 is a photoresist equipment developed by Allied Signal Inc. (ASI) that creates a layer of photoresist on a substrate. Photoresist is a light-sensitive material that is used to pattern substrate surfaces as part of a lithography process. It can be used in a variety of applications, including for creating semiconductor integrated circuits, flat panel displays, and micro-electronic components. 9025 photoresist system utilizes a double-exposure process to produce the desired pattern on the substrate. During this process, the substrate is first exposed to a layer of photoresist that has been previously soaked in a solution of ammonium salt. This process is known as "soft bake". The photoresist is then exposed to a light source, such as a mercury lamp, which triggers a chemical reaction where light-sensitive molecules react with the substrate material. Once the desired pattern is created at this stage, it is ready to go through the etching process. The second step of the photoresist unit is called "hard bake". It involves a more intense light source and usually requires additional steps, such as pre-baking or post-baking, in order to ensure the final product meets the customer specifications. During this phase of the process, the photoresist is again exposed to the light source, but this time, at a higher intensity and at a much faster rate. This allows the desired pattern to be etched with more definition and accuracy. ASI 9025 photoresist machine is a versatile and durable method for creating a highly accurate pattern on a substrate. The double-exposure process ensures that each substrate is exposed to light at the appropriate intensity and rate, ensuring that the desired pattern is etched with precision and reliability. The two-step process also helps ensure high-quality results and minimal waste on the substrate, maximizing efficiency and cost savings for the customer. The photoresist tool is highly customizable, allowing customers to adjust the photoresist's thickness, its exposure to light, and its reaction rate as needed for their applications. Overall, 9025 photoresist asset is an efficient and reliable method for creating precise patterns on substrates. With its double-exposure process and customizable options, it provides an effective and cost-effective way to create high-quality products in a variety of applications.
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