Used ASML 1150i #9197838 for sale

ASML 1150i is a photoresist equipment that utilizes advanced imaging technology to quickly and accurately identify opto-electronic components and related photoresist components for wafer processing. It features advanced laser systems with wavelength optimized illumination settings, a range of imaging sensors, and a powerful processing platform to enable accurate photoresist measurement. This system is suitable for both p-type and n-type photoresists, with the ability to accurately identify the material and corresponding electrical signal. It features automatic exposure control and alignment detection along with image optimization algorithms to ensure the highest quality results. The integrated image processing function also provides auto-correction and color recognition for the best photoresist identification performance. 1150i incorporates a high speed beam steering mechanism to ensure optimal signal detection and capture. It is also equipped with an advanced signal adaptation method to enable detection in the presence of background noise. Furthermore, the comprehensive power supply monitoring unit offers two independent power supply channels to ensure reliable and repeatable operation in photoresist systems. As a multi-channel unit, ASML 1150i can simultaneously measure multiple photoresist channels, with each channel providing 6-10 photo frames per second. This high-resolution imaging capabilities allows for detailed photoresist inspection and analysis. In addition to imaging capabilities, 1150i also has automated calibration modes to easily adjust settings for different sample compositions. The software also allows users to configure the machine for easy integration with photoresist production sites. Its intuitive user interface, comprehensive analysis tools, and fast operation make ASML 1150i a reliable solution for identifying photoresist components and characteristics. With optimal components and advanced image processing technology, this tool offers a cost-effective solution to accurately and reliably measure photoresist for wafer processing.