Used ASML XT 1900Gi #9298751 for sale

ASML XT 1900Gi is a photoresist equipment developed by ASML, a leading supplier of lithography equipment to the semiconductor industry. The system is a photolithographic tool that is used in semiconductor device manufacturing processes to create patterns on semiconductor wafers. It is based on a deep UV lithography unit and is used to create high-precision patterns on wafers. The machine employs an E-beam exposure source and a Mercury arc lamp source. The tool's exposure source is capable of a wide range of wavelengths - from 147 nm to 193 nm, depending on the application. The exposure source also features an adjustable laser shutter and reticle parameters. The asset is equipped with an advanced optical model which combines an optical design with a split focus technology. The equipment features a state-of-the-art wafer chuck which is designed to reduce particle contamination and reduce optics degradation. The system's photoresist processing is controlled by an advanced controller which allows for precise control over process consistency and accuracies. The unit is compatible with a variety of chemistries and supports both solvent and dry etch processes. In addition to that, the machine is capable of handling a variety of photoresist materials including ArF, KrF, and I-line. The tool can also be used as an exposure tool as it features a multi-channel, high-resolution wafer stepper. The stepper features high resolution linear motors and a fast axis compensation technology. Furthermore, the asset is also equipped with a large chuck table capable of handling substrates of up to 600 mm in size. The model's advanced automation capabilities provide an efficient and reliable solution for managing production runs. It integrates with ASML Automation Server, allowing users to easily manage and optimize the production process, as well as monitor and control all production runs from one centrally located location. In addition to the equipment's automation capabilities, the system is also equipped with a Chemical delivery unit which allows for controlled chemical delivery to the exposure source for etch, resist, and clean processes. The machine is also equipped with a sample management tool which provides an efficient workflow for sample handling. Overall, ASML XT:1900GI photoresist asset is a powerful and reliable exposure tool for lithography applications. It offers a high degree of process accuracy, automation capabilities, and flexibility. This model is a cost-effective solution for creating high-precision semiconductor patterns on wafers.