Used ASML XT 1900Gi #9375189 for sale

ASML XT 1900Gi is a photoresist equipment designed for advanced semiconductor device fabrication. The input to the system is an exposure to ultraviolet light which is used to create a physical pattern on a semiconductor wafer that serves as a template for the fabrication process. The output of the unit is a digitally precise image which is transferred to the wafer. The machine utilizes a very high resolution imaging tool and a high-power ultraviolet light source that is capable of fifteen times the standard lithography resolution. This allows the asset to generate incredibly precise patterns and structures on the wafer, enabling the development of extremely sophisticated microelectronic components. In addition, the model can be used in both direct-write lithography and contact lithography applications. ASML XT:1900GI comes equipped with an integrated reticle mounting module and auto-staged wafer handling equipment. This enables the system to achieve an extraordinary degree of accuracy and repeatability. The wafers are aligned accurately and securely on the reticle mounting module and then transferred to the exposure combiner, ensuring a precise correlation between the design elements of the wafer and the image generated by the unit. The unit also includes an integrated scanner that is capable of generating highly detailed images. This scanner is equipped with high-resolution optics, enabling it to generate complex patterns and structures with unparalleled clarity. Furthermore, the machine is able to generate images at a rapid rate, which allows for a range of new applications. XT1900 GI is highly automated, making it an ideal solution for photolithographic processes that require extremely precise patterns. Moreover, the unit is easy to operate and maintain, allowing it to be deployed in a wide variety of production environments. It is also compatible with a range of potential substrate materials and processes, enabling the production of a broad array of microelectronic devices. In conclusion, XT:1900GI is a powerful photoresist tool that has been optimized for advanced semiconductor device fabrication. It offers exceptionally high-resolution imaging capabilities, precise patterning, and fast auto-staging, enabling the fabrication of complex and extremely precise structures.