Used ASML XT 1900Gi #9401777 for sale

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Manufacturer
ASML
Model
XT 1900Gi
ID: 9401777
Wafer Size: 12"
Vintage: 2007
Stepper, 12" CIM: SECS, GEM Main body SMIF Factory interface AGILE Options system FOUP, 12" ART OHT Interface Smash alignment Baseliner focus CYMER XLA 360 Laser Retilce library Aux exhaust 2007 vintage.
ASML XT 1900Gi is a high-performance lithographic tool designed for the fabrication of microchips. It is a state-of-the-art photoresist equipment with a maximum imaging resolution of 250 nanometers. The system features an ultra-short UV laser, along with a suite of advanced process control and measurement protocols, allowing it to quickly and accurately expose photoresist and other materials to create intricate patterns on the substrate. ASML XT:1900GI is able to work with a wide range of materials, ranging from traditional organic photoresist to more modern synthetic nanocrystalline and block copolymer photoresists. The unit is composed of an immersion-lithography platform, with an advanced vision machine for pattern alignment and registration. For mask alignment, XT1900 GI uses an advanced structured-light imaging tool, which continuously monitors and adjusts the mask position during the exposure. The asset also utilizes a wide field of view camera that can view the entire substrate area, allowing for precise positioning and monitoring of small features. In addition, XT:1900GI includes an advanced photolithography process control model, using an advanced modeling and simulation capability that ensures high image accuracy, even when materials vary. The equipment is also able to rapidly perform wafer-to-wafer realignment and monitor process fluctuations via an advanced metrology system. The unit also features an integrated automation platform, with an advanced framework for managing both the hardware and software control of the lithography process. This allows the machine to quickly and easily integrate with other process equipment and remote systems, such as automated analysis systems, continuing the trend of miniaturization and improving the throughput of the tool. ASML XT1900 GI is a reliable, accurate, and efficient new photoresist asset for the modern semiconductor fab. It is highly versatile, offering the ability to precisely process a wide range of materials, with a resolution capable of producing even the most intricate patterns. Coupled with its advanced process control and automation capabilities, XT 1900Gi is an excellent tool for chip makers looking for the highest levels of quality and yield.
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