Used ASYMTEK C 341 #9253149 for sale
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ASYMTEK C 341 is a fully automated photoresist equipment designed for high precision coating and resist development. It features a 12 inch (305 mm) x 5 inch (127 mm) production area to handle large substrates for larger scale production. It is suitable for use with a wide range of applications including glass-ceramics and compound semiconductors. The system incorporates a precision spray technique providing high resolution and uniform coverage and is designed for continuous-flow spinner operation to ensure single coating of various substrates. It is operated with on-board diagnostics and an integrated PLC interface to facilitate communication with external controllers. It also includes an independent valve control mechanism to precisely control the amount of liquid needed to coat a substrate. C 341 includes a number of unique features that allow users to develop specialty resists and applications such as: an adjustable viscosity control to provide precise coating thickness; a programmed shut-off valve to prevent substrate surface temperature drift; a proprietary substrate temperature management unit; and adjustable spray patterns for uniform and low-shadowing coating. The machine also includes an electrostatic coating monitor and an integrated filter tool to remove particles and other impurities from the spray chamber. An inner chamber safety is included for increased safety when using solvents. The asset further features a rapid heat-up heater for corrections during a cycle to ensure uniform surface temperatures, as well as removable trays for easy cleaning. In addition to these features, ASYMTEK C 341 is backed by an extensive model warranty protecting its users from costly downtimes due to malfunction. Furthermore, its longevity is ensured by non-contact, infrared sensing technology to monitor the equipment's inner chamber. This allows for the highest quality of photoresist precision possible for repeatable, difinition-functional coating of glass-ceramics and other substrates. C 341 is a must have for any laboratory, research or production environment needing precision coating and resist development capabilities.
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