Used ASYMTEK C 741 #9213201 for sale

ASYMTEK C 741
Manufacturer
ASYMTEK
Model
C 741
ID: 9213201
Single head conformal coater.
ASYMTEK C 741 is a state-of-the-art precision coating equipment designed to deposit photoresist layer on a variety of substrates for circuit and chip design. This direct-drive, servo-based system has the ability to control layer thickness and uniformity to exacting standards, ensuring optimal results. ASYMTEK C-741 features a closed loop servo-controlled substrate indexing mechanism for accurate layer thickness repeatability and substrate positioning. It also comes equipped with a fully automated spin controller and reliable fluid valves for quick set-up and process optimization. C 741 is optimized for deposition of both positive and negative photoresists, and can handle a diverse range of wafer sizes and substrate materials including silicon, glass, plastic, and composite substrates. Its servo-driven deposition platform can achieve the highest possible resolution without sacrificing performance. An advanced tracking unit ensures uniformity throughout the process, and the dynamic control of accelerations, velocities, and edges ensure highly accurate coatings. C-741 is an advanced and feature-rich coating machine. Its user-oriented display screen provides a full range of process parameters including wafer rotation speed, pump pressure, and deposition rate. This allows for precise control over the entire manufacturing process, from start to finish. The tool also features remote monitoring capabilities, providing insight into running conditions and process analysis for rapid feedback and performance optimization. In terms of safety, ASYMTEK C 741 offers an easy to use, operator-friendly interface and the highest level of control available. An integral safety asset prevents hazardous misting and splashing of the spinning substrates. ASYMTEK C-741 is also equipped with an emergency stop button, allowing the operator to stop the machine in case of an emergency. In conclusion, C 741 is a precision coating model that provides superior performance and control for photoresist deposition. It offers reliable, repeatable, and accurate layer control for a variety of substrates, as well as user-friendly operation and safety measures.
There are no reviews yet