Used BAL-TEC SCD005 #293637972 for sale

BAL-TEC SCD005 is an advanced photoresist equipment that can be used for the manufacture of various micro-mechanical components. The system employs advanced nano-scale imaging technology to image the nanoscopic pattern employed in the production of the components. This nano-level imaging technology is based on a focused ion beam (FIB) that is used in combination with OpticWrite He-Ne laser, both of which are features of SCD005. The unit can create microstructures with extremely fine tolerances, as small as 1 nanometer in size, and is capable of producing highly accurate images in both the x-y and the z-axis. This allows for the creation of exceptionally intricate nanostructures, with a feature size that is on par with that of a modern microlithography process. BAL-TEC SCD005 photoresist machine also features a compact design that allows for easy handling and installation of the tool, as well as a user-friendly interface. The asset is also equipped with an integrated computer-controlled motion table, which allows for automated exposure and movement of the components within the exposure area, allowing for greater flexibility and accuracy. The model uses a combination of ion beam and laser exposure systems, allowing for maximum versatility in the control of the exposure process. Both of these exposure systems have advantages and disadvantages in terms of their accuracy and the production of high-quality images. The ion beam exposure equipment requires significant setup time to be able to produce high-resolution images with the smallest feature size, but once the system is set up, it is capable of producing consistent, high-quality images. The photon beam exposure is capable of producing extremely high resolution images with smaller feature size compared to the ion beam exposure. However, the photon beam unit also has drawbacks such as a lower tolerance for fluctuations in the exposure process, and is not able to create imaging profiles with finer feature sizes. SCD005 is an advanced photoresist machine that can be used for the manufacture of various micro-mechanical components. The tool employs advanced nano-scale imaging technology that offers maximum flexibility in the control of the exposure process, allowing for the production of highly accurate images with smallest feature size on par with that of a modern microlithography process. The asset is also equipped with user-friendly interface and computer-controlled motion table that allow for easy handling and installation of the model, as well as automated movements of the components in the exposure area.