Used BMB TUA SF 200-2 #9245250 for sale

BMB TUA SF 200-2 is a photoresist equipment that is designed for use in the production of printed circuit board (PCB) and other electronics applications. The system has a 200-micron film resolution and can be used in combination with a variety of base plates. This allows for a wide range of application possibilities with precise control over the process parameters. TUA SF 200-2 is designed to be used for dry film and emulsion photoresist processes. The unit includes a specially-designed xenon flash lamp and a reflective pre-shutter machine. The lamp is designed to emit a powerful and uniform light output, allowing for exact processes to be carried out without any variation in outcome. The pre-shutter tool allows for precise timing of the flash, helping to minimize any discoloration or other flaws in the image. The asset has a closed loop control model that ensures accuracy and repeatability of the process. This closed loop equipment provides a means to accurately monitor and adjust process parameters, ensuring a consistently high-quality product. The power supply system used with BMB TUA SF 200-2 is fully adjustable, providing users with maximum flexibility throughout the process. TUA SF 200-2 photoresist unit operates in a wide range of temperatures, from -5 to +35°C. This feature ensures that the photoresist film does not take damage caused by high temperatures during exposure. This allows for precise control over the process, including setting the exposure duration and amount of light that is used. The main advantage to using BMB TUA SF 200-2 is its flexibility. It is capable of helping in the production of a wide range of products, from printed circuit boards to computer chips. The accuracy and repeatability of the process are also valuable qualities. Additionally, the features of the device make it suitable for use in an array of industries, from electronic to medical and more. All in all, TUA SF 200-2 is a highly flexible, accurate and reliable machine for those looking to produce high-quality photoresist products.