Used BREWER SCIENCE 200X #9400327 for sale

BREWER SCIENCE 200X is a photoresist equipment for wafer processing that is aimed at providing improved process control optimization, low defectivity and improved yields. Photoresist is a light-sensitive material used in the manufacture of devices such as micro-chips. 200X system can be used for exposing photoresist through a photomask and for developing the wafer to create the desired pattern. BREWER SCIENCE 200X photoresist unit includes several components. These include a top plate, a bottom plate, an exposure head and a light source. The top plate has a photomask on it and the bottom plate holds the photoresist. The exposure head is comprised of optics which are designed to accurately focus the desired pattern of light onto the photoresist. The light source is a high intensity light source with a wavelength in the range of 197 nm and 248 nm. 200X machine can be used to pattern the photoresist with a wide range of features with a high degree of accuracy. The tool is designed to guarantee long-term, reliable and repeatable process control. It is especially designed to be able to handle photomasks with small features such as those required in advanced integrated circuits. BREWER SCIENCE 200X also offers advanced process control and optimization tools. These include a process controller which monitors and manages the exposure process as well as processes such as water-cooling, pre-baking and post-baking of the wafer. Other tools allow for the monitoring of photoresist coating thickness and image contrast and the collection of process data in real time. In addition, 200X photoresist asset offers a user-friendly PC-based software interface. This allows users to access and control the model remotely, including the ability to adjust the exposure and process parameters. The equipment can also be used in association with an automated vision inspection system, allowing for the automated inspection of photoresist images in order to check for patterns and to detect defects. Overall, BREWER SCIENCE 200X photoresist unit provides an effective tool for wafer processing with improved process control optimization, low defectivity and improved yields. It offers advanced process control and optimization as well as a user-friendly PC-based software interface. The machine is well suited for patterning photoresist with a wide range of features with high degrees of accuracy.