Used BREWER SCIENCE CEE 100CB #293620102 for sale

Manufacturer
BREWER SCIENCE
Model
CEE 100CB
ID: 293620102
Photoresist spinner.
BREWER SCIENCE CEE 100CB is an advanced, multi-component photoresist equipment designed for a range of photolithographic applications. Photoresists are materials typically used to develop patterns on semiconductors, MEMS/NEMS, and displays among other applications. BREWER SCIENCE CEE 100 CB is a positive-tone, epoxide-based solution for photoresist applications. It is suitable for low temperature photolithography on both planar and 3D surfaces. The system's components include a novolac epoxide, a Schiff base amine, and a colorless surfactant. The novolac epoxide provides excellent etch resistance and photospeed stability, allowing for precise control of etching profiles. Additionally, CEE 100CB's low thermal absorptivity prevents surface distortion. The Schiff base amine is used as a photoacid generator to further enhance the resolution of the pattern. The colorless surfactant improves the recognition of the exposed structure by increasing the photospeed of the resist. The photosensitivity of CEE 100 CB lies in the range between 230-270 nm, allowing the unit to be used with i-line, G-line and KrF exposure sources. Additionally, the photoresist can be develop with aqueous or solvent based solutions depending on the application. BREWER SCIENCE CEE 100CB is well-suited for a variety of high-precision applications. It excels in applications such as semiconductor substrates, MEMS/NEMS fabrication, and display test structures. Furthermore, its good edge definition and high resolution make it ideal for lithographic processes involving small-sized features. In summary, BREWER SCIENCE CEE 100 CB is a positive-tone resist machine designed for photolithographic applications. Its components provide excellent etch resistance, photospeed stability, and resolution while its photosensitivity allows it to be used with a variety of exposure sources. These features combined with its good edge definition and ability to develop with either aqueous or solvent based solutions make it ideal for a variety of high-precision applications.
There are no reviews yet